510 research outputs found

    Cherenkov radiation generated by a beam of electrons revisited

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    Copyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Physics of Plasmas, 12(9), 093105, 2005 and may be found at http://dx.doi.org/10.1063/1.204017

    Effect of cytokinins on shoot regeneration from cotyledon and leaf segment of stem mustard (Brassica juncea var. tsatsai)

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    Cotyledon and leaf segments of stem mustard (Brassica juncea var. tsatsai) were cultured on Murashige and Skoog medium supplemented with various concentrations of different cytokinins [6-benzyladenine (BA), N-(2-chloro-4-pyridyl)-n-phenylurea (CPPU), 6-furfurylaminopurine (KT) and thidiazuron (TDZ)] in combinations with different levels of ¿-naphthalene acetic acid (NAA). The shoot regeneration frequency of cotyledon and leaf segment was dependent on the kinds and concentrations of cytokinins used in the medium, while in most cases cotyledon gave high regeneration frequency than leaf segment. TDZ proved to be the best cytokinin to induce shoot from both cotyledon and leaf segments compared to BA, KT and CPPU. The highest frequency of shoot regeneration was 61.3¿67.9 % in cotyledon and 40.7¿52.4% in leaf segment respectively when 2.27 or 4.54 ¿M TDZ was combined with 5.37 ¿M NAA. Next to TDZ, CPPU was also very suitable to induce shoot formation both in cotyledon and leaf segment. When 1.61 ¿M CPPU was combined with 2.69 ¿M NAA, shoot regeneration frequency was 45.0% in cotyledon and 36.4% in leaf segment, respectively. It was also shown that KT and BA affected shoot regeneration from cotyledon and leaf segment, the shoot regeneration was greatly increased when NAA was added together with cytokinins. The efficient and reliable shoot regeneration system was developed in both cotyledon and leaf segments. This regeneration protocol may be applicable to the improvement of this crop by genetic engineering in the futur

    TEM Study on the Evolution of Ge Nanocrystals in Si Oxide Matrix as a Function of Ge Concentration and the Si Reduction Process

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    Growth and evolution of germanium (Ge) nanocrystals embedded into a silicon oxide (SiO₂) system have been studied based on the Ge content of co-sputtered Ge-SiO₂ films using transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy. It was found that when the proportion of Ge relative to Ge oxide is 20%, TEM showed that annealing the samples at 800°C for 60 min resulted in the formation of a denuded region between the silicon/silicon oxide (Si/SiO₂) interface and a band of Ge nanocrystals towards the surface of the film. By introducing a 20nm thick thermal oxide barrier on top of the silicon (Si) substrate on which the film is deposited, no denuded region in the bulk of this sample is observed. It is proposed that this barrier is effective in reducing both Ge diffusion into the Si substrate and Si diffusion from the substrate into the film. Si diffusing from the Si substrate reduces the Ge oxide into Ge which can subsequently diffuse into the Si substrate. However, the oxide barrier is able to confine the Ge within the oxide matrix so that the denuded region in the bulk of the film cannot form. However the reduction in diffusion should be more significant for Ge as its diffusion coefficient is lower than Si due to its larger size. It is suggested that the denuded region consists of amorphous Ge diffusing towards the Si/SiO₂ interface. When the Ge content is increased to slightly more than 70%, TEM showed that Ge nanocrysyals formed after annealing at 800°C for only 30 min for samples with and without the oxide barrier. There is no denuded region between the Ge nanocrystals band and the Si/SiO₂ interface for both samples but it was observed that coarsening effects were more prominent in the film deposited on top of the oxide barrier. The reduction effect of Si on Ge oxide should not play a significant role in these samples as the Ge content is high.Singapore-MIT Alliance (SMA

    Investigation on viscosity and non-isothermal crystallization behavior of P-bearing steelmaking slags with varying TiO2 content

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    The viscous flow and crystallization behavior of CaO-SiO2-MgO-Al2O3-FetO-P2O5-TiO2 steelmaking slags have been investigated over a wide range of temperatures under Ar (High purity, >99.999 pct) atmosphere, and the relationship between viscosity and structure was determined. The results indicated that the viscosity of the slags slightly decreased with increasing TiO2 content. The constructed nonisothermal continuous cooling transformation (CCT) diagrams revealed that the addition of TiO2 lowered the crystallization temperature. This can mainly be ascribed to that addition of TiO2 promotes the formation of [TiO6]-octahedra units and, consequently, the formation of MgFe2O4-Mg2TiO4 solid solution. Moreover, the decreasing viscosity has a significant effect on enhancing the diffusion of ion units, such as Ca2+ and [TiO4]-tetrahedra, from bulk melts to the crystal–melt interface. The crystallization of CaTiO3 and CaSiTiO5 was consequently accelerated, which can improve the phosphorus content in P-enriched phase (n2CaO·SiO2-3CaO·P2O5). Finally, the nonisothermal crystallization kinetics was characterized and the activation energy for the primary crystal growth was derived such that the activation energy increases from −265.93 to −185.41 KJ·mol−1 with the addition of TiO2 content, suggesting that TiO2 lowered the tendency for the slags to crystallize

    A study of charged kappa in J/ψ→K±Ksπ∓π0J/\psi \to K^{\pm} K_s \pi^{\mp} \pi^0

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    Based on 58×10658 \times 10^6 J/ψJ/\psi events collected by BESII, the decay J/ψ→K±Ksπ∓π0J/\psi \to K^{\pm} K_s \pi^{\mp} \pi^0 is studied. In the invariant mass spectrum recoiling against the charged K∗(892)±K^*(892)^{\pm}, the charged κ\kappa particle is found as a low mass enhancement. If a Breit-Wigner function of constant width is used to parameterize the kappa, its pole locates at (849±77−14+18)−i(256±40−22+46)(849 \pm 77 ^{+18}_{-14}) -i (256 \pm 40 ^{+46}_{-22}) MeV/c2c^2. Also in this channel, the decay J/ψ→K∗(892)+K∗(892)−J/\psi \to K^*(892)^+ K^*(892)^- is observed for the first time. Its branching ratio is (1.00±0.19−0.32+0.11)×10−3(1.00 \pm 0.19 ^{+0.11}_{-0.32}) \times 10^{-3}.Comment: 14 pages, 4 figure

    Measurements of the Mass and Full-Width of the ηc\eta_c Meson

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    In a sample of 58 million J/ψJ/\psi events collected with the BES II detector, the process J/ψ→γηc\psi\to\gamma\eta_c is observed in five different decay channels: γK+K−π+π−\gamma K^+K^-\pi^+\pi^-, γπ+π−π+π−\gamma\pi^+\pi^-\pi^+\pi^-, γK±KS0π∓\gamma K^\pm K^0_S \pi^\mp (with KS0→π+π−K^0_S\to\pi^+\pi^-), γϕϕ\gamma \phi\phi (with ϕ→K+K−\phi\to K^+K^-) and γppˉ\gamma p\bar{p}. From a combined fit of all five channels, we determine the mass and full-width of ηc\eta_c to be mηc=2977.5±1.0(stat.)±1.2(syst.)m_{\eta_c}=2977.5\pm1.0 ({stat.})\pm1.2 ({syst.}) MeV/c2c^2 and Γηc=17.0±3.7(stat.)±7.4(syst.)\Gamma_{\eta_c} = 17.0\pm3.7 ({stat.})\pm7.4 ({syst.}) MeV/c2c^2.Comment: 9 pages, 2 figures and 4 table. Submitted to Phys. Lett.

    A Measurement of Psi(2S) Resonance Parameters

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    Cross sections for e+e- to hadons, pi+pi- J/Psi, and mu+mu- have been measured in the vicinity of the Psi(2S) resonance using the BESII detector operated at the BEPC. The Psi(2S) total width; partial widths to hadrons, pi+pi- J/Psi, muons; and corresponding branching fractions have been determined to be Gamma(total)= (264+-27) keV; Gamma(hadron)= (258+-26) keV, Gamma(mu)= (2.44+-0.21) keV, and Gamma(pi+pi- J/Psi)= (85+-8.7) keV; and Br(hadron)= (97.79+-0.15)%, Br(pi+pi- J/Psi)= (32+-1.4)%, Br(mu)= (0.93+-0.08)%, respectively.Comment: 8 pages, 6 figure

    The σ\sigma pole in J/ψ→ωπ+π−J/\psi \to \omega \pi^+ \pi^-

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    Using a sample of 58 million J/ψJ/\psi events recorded in the BESII detector, the decay J/ψ→ωπ+π−J/\psi \to \omega \pi^+ \pi^- is studied. There are conspicuous ωf2(1270)\omega f_2(1270) and b1(1235)πb_1(1235)\pi signals. At low ππ\pi \pi mass, a large broad peak due to the σ\sigma is observed, and its pole position is determined to be (541±39)(541 \pm 39) - ii (252±42)(252 \pm 42) MeV from the mean of six analyses. The errors are dominated by the systematic errors.Comment: 15 pages, 6 figures, submitted to PL
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